Home · Software
Lithography control software: GDSII to wafer
Written in-house and running the job from layout to wafer. No third-party CAM chain, no licence dependencies. MVP level: everything below runs on the tool today.
What it does
- Native GDSII import, layers, automatic tiling
- Die arrays / step-and-repeat
- OPC assist and focus-exposure matrix
- Two-phase contrast autofocus under red light
- Resist-safe illumination: only blue exposes
- Per-tile exposure time and dose-sweep wafers
- Substrate height map, per-field Z
- CANopen servo motion, exposure interlocks
- Scientific camera pipeline, scale bar per objective
- Project files with stale-tile detection
Partnership
Looking for a manufacturing partner and investor
On the table: a working Prototype 1.0, the Prototype 2.0 design, full documentation and in-house software. A partner brings production, supply chain and market access; deal structure and investment size are open. Demonstrations and sample exposures by arrangement.